Haite company's HT-C series SiC products are ideal materials for CMP industrial application. Silicon carbide is a high-hardness ceramic, and its hardness is second only to diamond, cubic boron nitride and boron carbide. Due to its high wear resistance and relatively low cost, silicon carbide is used as a bulk or fixed abrasive material in many applications. 

With the development of the semiconductor industry, in the CMP (Chemical Mechanical Polishing) industry, the size of electronic devices has shrunk, and people require wafer surface flatness to reach the nanometer level. The traditional flattening scheme can only satisfy local flattening. The surface of the wafer can only be polished as a whole through CMP technology to achieve the ideal state. Haite company's HT-C series products are tailor-made for the chemical mechanical polishing industry. This series of products have become high-quality abrasives.